FirstNano

Apparatus

   

FirstNano EasyTube2000

Supplier

 

FirstNano

Location

 

P00.350

Main purpose

 

CVD of CNT’s and Graphene

System layout

 

Tube with peddle loader, Quartz Reaction Chamber

Gasses

 

H2, CH4, C2H4, Ar

Process information

 

deposition of CNTs and graphene at max. 1100°C

Facilities

   

Specimen

 

max. 3 inch wafer, small pieces allowed

Equipment owner

 

 

 

+31 6

 

Charles de Boer (back-up)

C.R.deBoer@tudelft.nl

+31 652169001