Anric AT410
Apparatus |
| Anric AT410 |
Supplier | Anric Technologies, Anric Technologies - ALD Tool - Atomic Deposition Layer - Anric Technologies | |
Location | P.00.350 | |
Function | Atomic Layer Deposition | |
Gasses | O2 and O3 | |
Substrate temp. | 40o C | |
System layout | No load lock, loading directly into the chamber | |
Chuck | Metal chuck, no clamping | |
Process information | Thermal ALD of Al2O3 | |
Facilities | Ozone generator | |
Specimen | Max. 100mm wafers, small pieces allowed. | |
Equipment owner | Bas van Asten +31 642481091 Marinus Fischer (back-up) +31 628906207 | |