AC EVA

Apparatus

    

AC450

Supplier

 

Alliance Concept

Location

 

P00.390

Main purpose

 

evaporator

System layout

  evaporation by e-beam heating (3x 7cc crucible liners)
Argon ion milling in the load-lock

Gasses

  Ar, N2

Power supply

   

Process information

  Materials: Cu, Ni, NiFe, Au

Facilities

  Deposition under an fixed angle is possible

Specimen

 

max. 50mm wafers, small pieces allowed

Equipment owner

 

Bas van Asten

B.vanAsten@tudelft.nl

+31 642481091

 

Marinus Fischer (back-up)

m.fischer@tudelft.nl

+31 628906207