ImPhys Colloquium | Junichi Tanaka

Title: From micro to nano, and beyond: measuring innovations

Abstract
Seeing an increasing role of MI in semiconductor manufacturing, we will first review the evolution of the MI technologies in the past few decades. Then the challenges we are facing in EUV era will be talked as for issues like thin resist, 3D features and massive measurements. Next, we will present our brief vision of future metrology. Finally, in course of our technology evolution of metrology, what we expect to TUD-HHT collaboration on MEMS optics to solve customer’s metrology issues.